Tīmeklis2024. gada 13. sept. · This paper investigates the use of plasma diagnostic monitoring to implement the right methodology to improve MTBC (Mean Time Between Clean) and decrease the defectivity on the LAM TCP9600. Description: The Lam 9600 is intended to etch aluminum metal and TiW layers with highly vertical sidewalls suitable for 0.35 um linewidth. The plasma is a medium-high density, transformer coupled plasma, similar to ICP sources, allowing separate control of coil (top electrode) power and platen (lower electrode) power.

Lam TCP9600 -2630R - YouTube

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WAFER PROCESSING EQUIPMENT - CIS-CORP

TīmeklisAdvanced Memory, Interconnect, Packaging, Transistor Coronus Product Family Plasma Bevel Clean These bevel clean systems remove unwanted materials from the wafer’s edge while protecting the active … TīmeklisDescription: The LamTCP 9600SE is intended to etch aluminum metal and TiW layers with highly vertical sidewalls suitable for 0.35 um line width. The plasma is a medium … TīmeklisLam 9600 配置信息：configured 8‘‘ wafer. TCP Etch source for metal etching. DSQ Module for resist strip. ESC with He cooling. Edwards STP-H1000C Turbo pump. AE … hcr 2 best cars